“INVEST IN KENYA,” PRESIDENT RUTO COURTS US INVESTORS AT UNGA - Kenyan News

President William Ruto has invited US investors to take advantage of the diverse investment opportunities available in Kenya. He highlighted the rich human capital as an asset it boasts.

“We have one of the best human capital anywhere in the world,” Ruto declared. “And I say so with a straight face.”

Ruto, while addressing the US-Kenya Business and Investment Roundtable at the Westin Times Square Hotel in New York, spoke at an event coinciding with the 79th Session of the United Nations General Assembly, which focuses on such global issues as climate action and sustainable development.

The President pointed out the new legislative measures taken by Kenya’s Parliament that would especially contribute to the country’s health sector, opening up huge investment opportunities.

“We have just advertised a big programme that will require many companies to invest in healthcare infrastructure,” he said. “This includes pharmaceuticals, medical devices, and health innovations.”

He flagged opportunities for private hospitals and specialized medical services, including cancer centers.

Besides that, Ruto highlighted renewable energy in Kenya. “We rely on 90 percent renewable energy,” he said, adding there are still gaps to fill. “I invite the American private sector to invest in closing this gap.”

He hopes Kenya will achieve 100 percent renewable energy use in seven years. “It is a small gap, but you can find your way in,” he encouraged.

He further turned attention to Kenya’s agricultural potential. “Therein lies a lot of potential in equipment manufacture and technologies,” he said, hinting that owing to the effects of climate change, there is much space for investment and opportunities in smart agriculture.

“That space is ripe for expansion; I say so because I am a farmer myself,” he added.

The President also mentioned investment possibilities in tea, coffee, cotton, leather, and the blue economy.

Share this
Tags:

Leave a Reply

Your email address will not be published. Required fields are marked *